Epitaxial ferroelectric oxides on silicon with perspectives for future device applications

M. Spreitzer, D. Klement, T. Parkelj Potocnik, U. Trstenjak, Z. Jovanovic, M. Nguyen, H. Yuan, J. ten Elshof, E. Houwman, G. Koster, G. Rijnders, J. Fompeyrine, L. Kornblum, D. Fenning, Y. Liang, W.-Y. Tong and Ph. Ghosez, APL Materials  9, 040701 (2021).